Product Series:
S1800 Series, Positive Photoresist, UV Photoresist.
Recommended Light Source: g-Line, also compatible with broadband exposure.
Single-Layer Thickness: 0.4–2.7 μm.
Models:
S1805 G2 / S1813 G2 / S1818 G2
Applications:
Suitable for wet etching and dry etching processes; also compatible with LOR bottom anti-reflective coating for lift-off processes.
Features:
· Complies with state-of-the-art physical, chemical and functional testing standards, ensuring batch-to-batch consistency.
· Absolute filtration accuracy of 0.2 μm, with low impurity content.
· Cellulose acetate and xylene free.
· High resolution.
· Excellent adhesion performance.
· Uniform coating thickness.
· Multiple standard viscosities available for single-layer processing.
· Compatible with both metal-ion-free (MIF) and metal-ion-containing (MIC) developers.
· Easy stripability.
