Product Introduction:
Product: RDP-75 Positive Photoresist.
Recommended Light Source: i-Line.
Single-Layer Thickness: 0.8–1.2 μm.
Applications:
Serves as photoresist for ion implantation masks, and is applied in micro-electro-mechanical systems (MEMS) and integrated circuit (IC) manufacturing processes.
Features:
· High-resolution positive photoresist
· 0.35 μm line width, high resolution, low standing wave effect, excellent sidewall verticality
