Product Introduction:
Product Series: HSQ Series, Negative Electron Beam Resist.
Recommended Light Source: E-beam, X-ray.
Single-Layer Thickness: 30–950 nm.
Models:
XR-1541-002 / XR-1541-004 / XR-1541-006 / fox15 / fox16 / fox24 / fox25
Applications:
HSQ is a negative electron beam resist based on hydrogen silsesquioxane (HSQ) cage oligomer, suitable for serving as a mask in nanoscale dry etching processes.
Features:
· Ultra-high resolution (the highest-resolution photoresist with an ultimate limit of several nanometers).
· Excellent etch resistance.
· Superior vertical sidewall profile.
· High contrast.
· Low dielectric constant.
