Product Introduction:
Product Series: EM PMMA, Positive Electron Beam Resist.
Recommended Light Source: E-beam.
Single-Layer Thickness: 30–2000 nm.
Models:
950K 0.1-1 / 495K 0.1-1 / 120K 0.1-1.2 / 35K 0.1-1.2
Applications:
Suitable for electron beam lithography, nanoimprint lithography, and graphene transfer processes.
Features:
· High resolution.
· Multiple molecular weight options.
