Product Introduction:
Product Series: RE300 Series, Positive Electron Beam Resist.
Recommended Light Source: E-beam, X-ray.
Models:
Applications:
The RE300 Series positive electron beam resists are based on Polymethyl Methacrylate (PMMA) polymers, and are applicable for photomask fabrication, metal lift-off and electroplating mask processes.
Features:
· Multiple molecular weight options, soluble in various solvents.
· High resolution.
· Excellent film-forming property.
· Suitable for coating on various substrates.
