Product Introduction:
Product Series: SML Series, Positive Photoresist, Electron Beam Resist.
Recommended Light Source: E-beam.
Single-Layer Thickness: 50–5000 nm.
Models:
SML50 / SML100 / SML300 / SML600 / SML1000 / SML2000
Applications:
The high-performance SML electron beam resist is a novel polymer specially designed to meet the requirements of electron beam lithography (EBL). It is capable of patterning high-resolution and high-aspect-ratio structures, even at low acceleration voltages without the need for proximity effect correction (PEC).
Features:
· Safe and easy to handle, compatible with PMMA-based electron beam lithography processes
· Superior LER/LWR performance
· Excellent sidewall verticality
· High contrast
· Good adhesion (HMDS pre-treatment not required)
