Product Introduction:
Product Series: Microchem PMMA/MMA Series, Positive Electron Beam Resist.
Recommended Light Source: E-beam, X-ray & deep UV imaging.
Single-Layer Thickness: 50–5000 nm.
Models:
495K PMMA 1-10 / 950K PMMA 1-10
Applications:
Microchem PMMA/MMA Series electron beam resists are suitable for electron beam lithography, multi-layer T-Gate lift-off, wafer thinning, PHEMT fabrication and other processes.
Features:
· Line width ＜100 nm, ultimate line width of 20 nm.
· Excellent adhesion to substrates.
· Multiple molecular weight options, soluble in various solvents.
