Product Introduction:
Product Series: SU-8 2000 Series, Negative Photoresist, Near UV (350–400 nm).
Recommended Light Source: i-Line, also applicable for E-beam and X-ray exposure.
Single-Layer Thickness: 0.5–650 μm.
Models:
SU-8 2000.5 / SU-8 2000.2 / SU-8 2007 / SU-8 2010 / SU-8 2015 / SU-8 2025 / SU-8 2035 / SU-8 2050 / SU-8 2075 / SU-8 2150
Applications:
SU-8 is widely used in micromachining and other microelectronic applications, such as electroplating mold fabrication, sensor manufacturing, and micro-nano structure patterning.
Features:
· Low molecular weight.
· Excellent solubility.
· High transparency.
· Capable of forming smooth film layers.
· Low glass transition temperature (Tg).
· Reducible viscosity.
· Ultra-thick film formation via single spin coating (650 μm).
· Uniform coating thickness.
· High aspect ratio (10:1).
· Outstanding chemical resistance.
· Good biocompatibility (for microfluidic chips).
