Product Introduction:
Product: RDN-91, Negative Photoresist.
Recommended Light Source: i-Line.
Single-Layer Thickness: 40–130 μm (Dual-layer coating available).
Applications:
Suitable for microfabrication and other microelectronic applications, including sensors, microfluidic devices, bulk silicon devices, electroplating & electroforming, bump fabrication and other fields.
Features:
·Packaging-grade negative photoresist.
·Excellent thickness uniformity.
·High resolution with vertical profile.
