Product Introduction：
NR Series Photoresist, Negative Tone.
Recommended Light Source: Photosensitive wavelength ＜380nm, i-line.
Single-Layer Thickness: 0.5-25μm.
Models:
NR9-1500PY/NR9-3000PY/NR9-6000PY/NR9-8000.
NR77-1500PY/ NR77-3000PY/ NR77-6000PY.
NR21-20000P.
Application:
Suitable for metallic patterning in MEMS, packaging, biochip and other processes, and is recommended to avoid dry etching processes.
Features:
● Undercut formation during development.
● Adjustable photoresist undercut size based on exposure energy.
● Excellent line width achieved via surface topology control.
● High sidewall verticality.
● High resolution (for thick photoresist).
● High photosensitivity.
● Excellent adhesion.
● High temperature resistance.
