Model:
MIBK/IPA 1:3
Main Components:
Isopropanol (20-80%)
CAS 67-63-0
4-Methyl-2-pentanone (20-80%)
CAS 108-10-1
Principle & Application Method:
PMMA (Polymethyl Methacrylate) is a high-resolution, high-contrast positive electron beam photoresist, which can be exposed to electron beam, deep ultraviolet (DUV, 220-250 nm) and X-ray radiation. Pattern structures are obtained through the scission of the polymer main chain, resulting in a reduction in molecular weight, with low-molecular-weight polymers dissolving in the developer solution.
Developers for PMMA are typically mixed solutions of MIBK and IPA. MIBK acts as the solvent and active agent, controlling the dissolution and swelling rates of PMMA, while IPA (isopropanol) functions as the non-solvent. PMMA development is commonly performed using MIBK:IPA mixed solutions with different ratios (1:1, 1:2, 1:3). Mixed solutions with a higher MIBK content yield an accelerated development rate and thus improve the developing speed. In contrast, mixed solutions with a higher IPA content result in a slower development rate but are suitable for the development of high-resolution line patterns.
Storage:
Ensure adequate ventilation and exhaust systems in the working area;
Store in sealed containers and keep in a cool, dry place;
Use explosion-proof equipment/devices and spark-proof tools;
Keep away from heat sources and direct sunlight;
Keep away from open flames and no smoking;
Prevent electrostatic discharge (ESD).
