Model:
Resist Remover RR41
Main Components:
Dimethyl Sulfoxide (DMSO) 20-80%
CAS 67-68-5
Amino Derivatives 20-80%
Principle and Operating Instructions:
Resist Remover RR41 is a stripping solution that removes photoresist from the substrate surface through swelling and dissolution.
Operating Instructions:
1、Pour the solution into the photoresist stripping tank;
2、Heat the solution to 100°C in a fume hood;
3、Immerse the photoresist-coated substrate in the solution for 5 minutes;
4、Rinse the substrate with deionized water until the water resistivity meets the specified requirements.
Storage:
Ensure adequate ventilation and exhaust systems are installed in the working area;
Seal the product in airtight storage containers and store in a cool, dry place;
Use explosion-proof equipment and spark-free tools during handling;
Keep away from heat sources and direct sunlight;
Keep away from ignition sources, and smoking is prohibited.
