Model:
SU-8 Developer
Main Components:
2-Methoxy-1-propyl acetate <0.5%
CAS 70657-70-4
1-Methoxy-2-propyl acetate >99.5%
CAS: 108-65-6 (PGMEA)
Mechanism & Application Method:
For SU-8 series photoresists, development is conducted via alternate immersion in Propylene Glycol Methyl Ether Acetate (PGMEA) and Isopropyl Alcohol (IPA). Generally, three glass tanks and one development basket with a hollowed bottom are prepared, and PGMEA, IPA and IPA are poured into the three glass tanks in sequence. The development basket facilitates the transfer of silicon wafers during the development process. The unexposed photoresist areas undergo no cross-linking reaction and are susceptible to swelling by PGMEA; subsequent immersion in IPA can strip the swollen photoresist from the silicon wafer surface. Repeat the above steps until no floccules are observed, then rinse the wafers in clean IPA to dissolve residual PGMEA. The Desktop Automatic Developer Meitu SD-100-T is also an optional device for the development process. After development, dry the wafers with nitrogen purge.
Storage:
Ensure the workshop is equipped with adequate ventilation and exhaust systems;
Seal the product in airtight containers and store in a cool, dry and low-temperature area;
Keep away from heat sources and direct sunlight;
Keep away from ignition sources and prohibit smoking in the storage area;
Prevent electrostatic discharge;
Do not store with alkali metals (caustic alkaline solvents), oxidizing substances or acidic substances.
