Model:
OmniCoat
Main Components:
Cyclopentanone 75-100%
CAS 120-92-3
1-Methoxy-2-propanol 5-25%
CAS 107-98-2
Mechanism & Application Method:
OmniCoat is used for stripping stubborn photoresist and other materials, and can also enhance the adhesion between photoresist and substrate.
