Model:
MICROPOSIT® MF-319 DEVELOPER
Main Components:
Water ＞95%
CAS 7732-18-5
Surfactant ＜1%
Tetramethylammonium Hydroxide (TMAH) 2.2%
CAS 75-59-2
Principle and Application Method:
MF-319 Developer is specially formulated for high-resolution semiconductor devices. It is a metal-ion-free developer exclusively designed for S1400® and S1800® series photoresists. While MF-319 Developer is compatible with immersion development and spin spray development, the optimal development methods are spray development or puddle development.
Storage:
Store in a dry area at a temperature range of 50°–90°F (10°–32°C);
Keep away from acids, direct sunlight, heat sources and ignition sources;
Seal in airtight storage containers.
