Model:
PGMEA
Main Component:
Propylene Glycol Methyl Ether Acetate (PGMEA) ＞99.5%
CAS 108-65-6
Principle and Operating Instructions:
During the photolithography process, cross-linking reaction occurs in the exposed SU-8 areas, while the unexposed areas remain uncross-linked. The developer reveals the patterns by dissolving the uncross-linked SU-8, and features high selectivity that only dissolves the uncross-linked SU-8 without affecting the cross-linked areas, thus ensuring the precision and integrity of the patterns.
Operating Instructions: Immerse the post-exposure baked wafer (loaded in the wafer basket) into the SU-8 developer, and gently agitate the basket for development. The development time shall be determined in accordance with the process conditions. Immerse the substrate in an isopropyl alcohol (IPA) bath for approximately 30 seconds.
Note: White residues on the substrate surface indicate incomplete development. Repeat the above steps for 1-2 minutes each time until no white residues are observed in the IPA bath, then perform the above operation once more. Dry both the front and back surfaces of the substrate under a nitrogen stream. Conduct microscopic inspection; if incomplete development areas are present, repeat the aforementioned development operation.
Storage:
Use spark-free or explosion-proof tools and utensils during handling;
Keep containers tightly sealed when not in use;
Store the product in containers made of carbon steel, stainless steel or polytetrafluoroethylene (PTFE);
Smoking, open flames and ignition sources are strictly prohibited in the storage area;
Ground all associated equipment effectively;
Do not cut, drill, grind, weld or perform any such operations near empty containers;
Do not transfer the product by means of air pressurization.
