Model:
SU-8 Developer
Main Components:
2-Methoxy-1-propyl acetate ＜0.5%
CAS 70657-70-4
1-Methoxy-2-propyl acetate (PGMEA) ＞99.5%
CAS 108-65-6
Principle and Operating Instructions:
For SU-8 series photoresists, development is performed via alternate immersion in Propylene Glycol Methyl Ether Acetate (PGMEA) and Isopropyl Alcohol (IPA). Generally, prepare three glass tanks and a development basket with a hollowed bottom; fill the three glass tanks with PGMEA, IPA and IPA in sequence. The development basket facilitates the transfer of silicon wafers during the development process. The unexposed photoresist areas undergo no cross-linking reaction and are susceptible to swelling by PGMEA. Subsequent immersion in IPA strips the swollen photoresist off the silicon wafer surface. Repeat the immersion process until no floccules are observed, then rinse the wafers in clean IPA to dissolve residual PGMEA. The MEITU SD-100-T desktop automatic developer is also an optional development tool. After development, blow the wafers dry with nitrogen gas.
Storage:
Ensure the working area is equipped with adequate ventilation and exhaust systems;
Seal in airtight storage containers and store in a cool, dry and low-temperature environment;
Keep away from heat sources and direct sunlight;
Keep away from ignition sources and smoking is prohibited;
Prevent electrostatic discharge;
Do not store with alkali metals (caustic alkaline solvents), oxidizing substances or acidic substances.
