Model:
MIBK/IPA 1:3
Main Components:
Isopropyl Alcohol (IPA) 20-80%
CAS 67-63-0
4-Methyl-2-pentanone (MIBK) 20-80%
CAS 108-10-1
Principle and Operating Instructions:
Polymethyl Methacrylate (PMMA) is a positive electron beam photoresist with high resolution and high contrast, which is applicable for exposure via electron beam, deep ultraviolet (DUV) light (220-250nm) and X-ray. Pattern structures are obtained through the scission of the polymer main chain that leads to molecular weight reduction, with the low-molecular-weight polymers dissolving in the developer subsequently.
The developer for PMMA is generally a mixed solution of Methyl Isobutyl Ketone (MIBK) and Isopropyl Alcohol (IPA). MIBK acts as the solvent and active agent, controlling the dissolution and swelling rates of PMMA, while IPA (Isopropyl Alcohol) serves as the non-solvent. PMMA development is commonly performed with MIBK:IPA mixed solutions of different ratios (1:1, 1:2, 1:3). Mixed solutions with a higher MIBK content result in an accelerated development rate and thus an improved developing speed. In contrast, mixed solutions with a higher IPA content yield a slower development rate, which is however suitable for the development of high-resolution line patterns.
Storage:
Ensure the working area is equipped with adequate ventilation and exhaust systems;
Seal in airtight storage containers and store in a cool, dry place;
Use explosion-proof equipment and spark-free tools during handling;
Keep away from heat sources and direct sunlight;
Keep away from ignition sources and smoking is prohibited;
Prevent electrostatic discharge (ESD).
